High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment

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  • High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
  • High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
  • High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
  • High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
  • High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
  • High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
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  • Overview
  • Product Description
  • Product Parameters
  • Our Advantages
  • Company Profile
  • More Product Recommed
  • Our Exhibition
  • Our Clients
Overview

Basic Info.

Laser Visibility
Invisible
Applicable Material
Nonmetal
Cooling System
Water Cooling
Technical Class
Pulse Laser
Laser Wavelength
355nm
Laser Classification
Solid Laser
Type
UV Laser
Marking Method
Scanning Marking
OEM&ODM
Accept
Certificate
CE,ISO9001
Transport Package
Wooden Case
Specification
1008mmX1700mmX1900mm
Trademark
INTE
Origin
China
Production Capacity
100sets/Month

Packaging & Delivery

Package Size
120.00cm * 190.00cm * 210.00cm
Package Gross Weight
2200.000kg

Product Description


 
Product Description

Introducing our cutting-edge UV Laser Wafer Marking Machine, engineered to deliver unparalleled precision and efficiency in semiconductor manufacturing. This fully automatic dual platform system represents the pinnacle of wafer processing technology, designed specifically for high-volume electronics production environments.

High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
Product Parameters
Laser Type
Nanosecond UV
Processing Area
customized
Machine Dimensions
1008mmX1700mmX1900mm
Processing Accuracy
± 0.02mm
Total Power Consumption
2KW
Machine Weight
2000 KG
Environment Requirements
Temperature: 22°C ± 2°C;
Humidity: 30%~60% (Non-condensing)

 
Our Advantages

Advanced Automation & Dual Platform System

Fully Automatic Operation——Our machine features complete automation capabilities, including:

  • Automatic loading and unloading systems
  • Integrated fault detection and pattern recognition
  • One-click sampling functionality
  • Front and back wafer marking capabilities


Dual Platform Technology

  • Simultaneous processing on two platforms
  • Enhanced production throughput
  • Reduced cycle times
  • Improved overall equipment efficiency


Technical Advantages

Precision & Quality

  • Ultra-fine marking capabilities
  • High beam quality ensuring consistent results
  • Back-to-back marking precision
  • Superior positioning accuracy


Speed & Efficiency

  • Fast processing speeds without compromising quality
  • Dual platform system maximizes productivity
  • Automated workflow reduces manual intervention
  • Streamlined production cycle
 

Why Choose Our UV Laser Wafer Marking Machine?

Industry-Leading Precision
With ±0.02mm accuracy, our machine meets the most demanding semiconductor industry standards, ensuring perfect markings every time.

Maximum Efficiency
The dual platform system and fully automatic operation significantly increase production capacity while maintaining exceptional quality control.

Reliability & Durability
Built with premium components and rigorous quality standards, our equipment delivers consistent performance in demanding manufacturing environments.
 

Company Profile

 

High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
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High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment
Our Exhibition

High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment

Our Clients

High Precision ±0.02mm UV Laser Wafer Marking Machine - Fully Automatic Dual Platform Semiconductor Processing Equipment

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